Research facilities

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Device Processing & Thin Film Deposition

  • Clean Room processing: See Nanofab facilities
  • Texturing/nanostructures: RIE, FIB, wet etching
  • Doping: Spin-on glass (B,P), P diffusion POCl3, Ion implantation (B, P)
  • Patterning: Optical litography, E-beam
  • Thin films: ALD, LPCVD, PECVD, Thermal Oxidation, Sputtering, Evaporation
     

Characterization

 

Modeling

Page content by: | Last updated: 29.12.2016.