Dissertation in the field of nanotechnology, Alexander Christian Pyymaki Perros
The title of thesis Thermal and plasma-enhanced atomic layer deposition: the study of and employment in various nanotechnology applications
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This thesis focuses on atomic layer deposition (ALD) and presents results divided between two parts. The first part examines plasma-enhanced atomic layer deposition (PEALD) of AlN and the effects processing conditions have on material properties and growth. The second part focuses on the employment of various ALD thin films for diverse nanotechnology applications.
A new type of graphene-alumina composite membrane was developed and mechanically assessed using the bulge test. The composite membrane is significantly more robust than plain Al2O3, withstanding at least 3 times more differential pressure. Raman measurements indicated the graphene reinforcing layer remains undamaged after bulge testing despite cracking in the ALD layer.
Opponent: Professor Alexey Y. Kovalgin, University of Twente, The Netherlands
Supervisor: Professor Harri Lipsanen Aalto University School of Electrical Engineering, Department of Micro- and Nanosciences